====== primaxx ======

{{ map-primaxx.svg|NanoLab map showing primaxx location}}

[[https://docs.google.com/document/d/1HrWAXNa7P8gIGWwhzTrYoYCvWThcm8Cl9GVnIBhR5Qo/edit?usp=sharing|NanoLab primaxx manual]]

primaxx is an HF vapor etching tool. We use it to remove SiO2 from MEMS devices without the stiction issues caused by using a liquid etch.

{{primaxx.jpg?0x200 |picture of primaxx tool}}

===== Process Notes =====

^ Date ^ Person ^ Data ^
| 3 Feb 2021 | Daniel | Using RECIPE5 (the fastest etch available; I don't see a need for a slower one here) to release SOI structures. Vary etch time as desired for given etch distance (and the tool manual recommends etch cycles of at least 5 minutes each and ideally around 10; run as many cycles as need be to achieve total etch time). Measurements imply RECIPE5 etches somewhere around 0.1um/s (the manual claims 0.13um/s, which agrees). We need a good test structure to measure this: our previous SOI-based structure didn't account for SOI footing, which can be significant occasionally. |