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--- cha [2021/02/07 20:09]
dteal created
+++ cha [2021/11/21 17:36] (current)
dteal
@@ Line 1: / Line 1: @@
 ====== cha ======
-{{ map-cha.svg?100|NanoLab map showing cha location}}
+{{ map-cha.svg|NanoLab map showing cha location}}
 [[https://docs.google.com/document/d/1RAwxAD7kOLh9HgNd_HICKrMTNw4xvVO0Y-zNleuDcHE/edit?usp=sharing|NanoLab cha manual]]
-cha is an e-beam evaporator. It can process three wafers at once. We often use it to deposit chromium and gold.
+cha is a multi-material e-beam evaporator. It holds three wafers (or chips) at once in a rotating planetary mount. We often use it to deposit chromium and gold. This is the standard evaporator for the NanoLab. A good backup is ebeam1, which has extremely similar capabilities (save cha's fancy but optional automatic deposition rate controller).
+{{cha.jpg?0x200 |picture of cha tool}}
+===== Process Notes =====
+^ Date ^ Person ^ Data ^
+| 22 Oct 2020 | Daniel | Tool power supply is replaced and is more powerful; processes should be recalibrated. |
+| 21 May 2021 | Daniel | Cr evaporates at about 25mA (45% LOW beam power). Au evaporates at about 40mA (60% LOW beam power). |
+| 12 Jul 2021 | Daniel | Ti evaporates at about 65mA (36% MID beam power). Pt evaporates at about 170mA (51% MID beam power). Both are extremely bright and heat the wafer significantly. |
+| 12 Jul 2021 | Daniel | 11nm Ti + 70nm Pt on standard 2um MiR701 makes photoresist start to flake/reticulate; more causes cracking. Liftoff works but barely. |

Berkeley Autonomous Microsystems Lab

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