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| 16 Jun 2021 | Daniel | Heidelberg field service engineer tuned up tool. Now: optical autofocus is best at focus -2, pneumatic autofocus is best at focus +4, top side alignment accuracy within 300nm (spec 500nm), bottom side accuracy within 850nm (spec 1um), and required exposure dose should be 50% to 75% higher than previous recorded values. | | | 16 Jun 2021 | Daniel | Heidelberg field service engineer tuned up tool. Now: optical autofocus is best at focus -2, pneumatic autofocus is best at focus +4, top side alignment accuracy within 300nm (spec 500nm), bottom side accuracy within 850nm (spec 1um), and required exposure dose should be 50% to 75% higher than previous recorded values. | | ||
| 12 Jul 2021 | Daniel | Spun standard 2um MiR701 on picotrack after a primeoven recipe 2 on a fused silica wafer. Using pneumatic autofocus, a dose of 210mJ/cm2 and focus +4 exposed the pattern fairly well, +/- 0.2um, but did not do full dosage test. | | | 12 Jul 2021 | Daniel | Spun standard 2um MiR701 on picotrack after a primeoven recipe 2 on a fused silica wafer. Using pneumatic autofocus, a dose of 210mJ/cm2 and focus +4 exposed the pattern fairly well, +/- 0.2um, but did not do full dosage test. | | ||
+ | | 10 Oct 2021 | Daniel | Ran exposure test for AZ P4620. Use primeoven recipe 2 for HMDS, then spin 12um AZ P4620 with standard picotrack recipe (optionally no TEBR). Ideal exposure was at 800mJ/cm2, 0 defocus. Higher exposures will make large nitrogen bubbles in the resist (this is probably a result of heating, so it could be solved by exposing more slowly or in multiple shorter exposures, but that isn't an option on mla150); lower exposures will not completely develop. Can run through standard picotrack2 develop recipe twice for better effect (not all exposed PR is completely removed the first time; thick resists are tricky). Any further descum or hardbake will reflow the photoresist; | ||
+ | | 11 Oct 2021 | Daniel | Exposed AZ P4620 with < 20% ambient humidity in NanoLab (there' |