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nanolab
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| Both sides previous revision Previous revision Next revision | Previous revision | ||
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nanolab [2021/02/10 00:24] dteal |
nanolab [2021/11/21 17:45] (current) dteal |
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| * [[asap-liftoff|asap-liftoff automatic liftoff tool]] | * [[asap-liftoff|asap-liftoff automatic liftoff tool]] | ||
| + | * [[ast-sputter|ast-sputter sputterer]] | ||
| * [[axcelis|axcelis UV hardbake oven]] | * [[axcelis|axcelis UV hardbake oven]] | ||
| * [[cha|cha metal evaporator]] | * [[cha|cha metal evaporator]] | ||
| * [[disco|disco dicing saw]] | * [[disco|disco dicing saw]] | ||
| + | * [[irscope|irscope microscope with IR illumination to see through Si wafers]] | ||
| + | * [[keyence|keyence microscope]] | ||
| * [[mla150|mla150 maskless exposure tool]] | * [[mla150|mla150 maskless exposure tool]] | ||
| + | * [[olympus|olympus 3D confocal microscope]] | ||
| * [[optical-microscopes|optical microscopes]] | * [[optical-microscopes|optical microscopes]] | ||
| * [[picotrack|picotrack1/ | * [[picotrack|picotrack1/ | ||
| Line 21: | Line 25: | ||
| ===== Recipes ===== | ===== Recipes ===== | ||
| - | * [[recipe-liftoff|metal liftoff process]] | + | * [[recipe-liftoff|liftoff process]] |
| - | * [[recipe-backsideetch|through-wafer | + | * [[sts2|DRIE silicon etch process |
| - | * [[recipe-frontsideetch|40um | + | |
| ===== Equipment ===== | ===== Equipment ===== | ||
| Line 29: | Line 32: | ||
| * [[wafers|list of blank wafers on our group' | * [[wafers|list of blank wafers on our group' | ||
| * [[masks|mask ordering information]] | * [[masks|mask ordering information]] | ||
| + | * [[wafers|wafer ordering information]] | ||
| ===== Processes ===== | ===== Processes ===== | ||
| Line 34: | Line 38: | ||
| Standard fabrication processes and design rules. | Standard fabrication processes and design rules. | ||
| - | 550-2-40 SOI process. | + | * [[soi-process|550-2-40 SOI process]] |
nanolab.1612945497.txt.gz · Last modified: 2021/02/10 00:24 by dteal
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