Differences

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--- primaxx [2021/02/07 20:22]
dteal
+++ primaxx [2021/12/03 01:23] (current)
dteal [Process Notes]
@@ Line 1: / Line 1: @@
 ====== primaxx ======
-{{ map-primaxx.svg?100|NanoLab map showing primaxx location}}
+{{ map-primaxx.svg|NanoLab map showing primaxx location}}
 [[https://docs.google.com/document/d/1HrWAXNa7P8gIGWwhzTrYoYCvWThcm8Cl9GVnIBhR5Qo/edit?usp=sharing|NanoLab primaxx manual]]
-primaxx is an HF vapor etching tool. We use it to remove SiO2 from MEMS devices without stiction issues caused by using a liquid etch.x
+primaxx is an HF vapor etching tool. We use it to remove SiO2 from MEMS devices without the stiction issues caused by using a liquid etch.
+{{primaxx.jpg?0x200 |picture of primaxx tool}}
+===== Process Notes =====
+^ Date ^ Person ^ Data ^
+| 3 Feb 2021 | Daniel | Using RECIPE5 (the fastest etch available; I don't see a need for a slower one here) to release SOI structures. Vary etch time as desired for given etch distance (and the tool manual recommends etch cycles of at least 5 minutes each and ideally around 10; run as many cycles as need be to achieve total etch time). Measurements imply RECIPE5 etches somewhere around 0.1um/s (the manual claims 0.13um/s, which agrees). We need a good test structure to measure this: our previous SOI-based structure didn't account for SOI footing, which can be significant occasionally. |

Berkeley Autonomous Microsystems Lab