User Tools

Site Tools


asap-liftoff

Differences

This shows you the differences between two versions of the page.

Link to this comparison view

Both sides previous revision Previous revision
asap-liftoff [2021/07/13 22:20]
dteal
asap-liftoff [2021/11/21 17:34] (current)
dteal
Line 11: Line 11:
 ^ Date ^ Person ^ Data ^ ^ Date ^ Person ^ Data ^
 | 10 Sep 2020 | Daniel | Recipe 17 (high intensity 6" wafer with soak) appears to work fine for Cr + Au liftoff with standard 2um MiR701. | | 10 Sep 2020 | Daniel | Recipe 17 (high intensity 6" wafer with soak) appears to work fine for Cr + Au liftoff with standard 2um MiR701. |
-| 10 Dec 2020 | Daniel | Accidentally UV hard baked standard 2um MiR701 with axcelis recipe U for 26nm Cr + 282nm Au liftoff. Had to run recipe 17 (high intensity 6" wafer with soak) 13 times (!) to complete liftoff, but it worked in the end. |+| 10 Dec 2020 | Daniel | Accidentally UV hard baked standard 2um MiR701 with axcelis recipe U for 30nm Cr + 280nm Au liftoff. Had to run recipe 17 (high intensity 6" wafer with soak) 13 times (!) to complete liftoff, but it worked in the end. |
 | 12 Jul 2021 | Daniel | Recipe 14 (low intensity 6" wafer with soak) is sufficient to liftoff 2um MiR701 with 11nm Ti, 70nm Pt. | | 12 Jul 2021 | Daniel | Recipe 14 (low intensity 6" wafer with soak) is sufficient to liftoff 2um MiR701 with 11nm Ti, 70nm Pt. |
 +| 6 Nov 2021 | Daniel | Recipe 13 (6" wafer, lowest pressure, soak) used to successfully liftoff 2um MiR701 with 20nm Ti, 80nm Pt, but the metal peels away in some places, perhaps due to lack of descum before metal evaporation? |
 +| 6 Nov 2021 | Daniel | Recipe 1 (6" wafer, lowest pressure, no soak) is sufficient to liftoff 2um MiR701 with 200nm Cr, 100nm Au. |
  
asap-liftoff.1626240008.txt.gz ยท Last modified: 2021/07/13 22:20 by dteal