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microfabrication
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Table of Contents
Microfabrication
Photolithography
Masks vs direct write. Limits on resolution. Rules of thumb. Use gcaws6, mla150 in nanolab.
Evaporation
Anisotropic deposition. Low temperature. Adhesion layers. Use cha in nanolab.
Photoresist
Fundamental step. Spin vs. spray. picotrack in nanolab.
RIE and DRIE
Anisotropic etch. Silicon vs. other materials. Etch rates.
Sputtering
ALD
Wet Etch
Electroplating
microfabrication.1606744631.txt.gz · Last modified: 2020/11/30 05:57 by dteal
