NanoLab mla150 manual

mla150 is a maskless exposure tool. It can expose photoresist to 0.6um resolution on almost any size wafer with both frontside and backside alignment. Because no mask is required, unlike traditional photolithography tools, photoresist can be exposed half an hour after designing a layout. This also allows patterning gigantic features the size of the entire wafer with micron resolution. Exposing a 6“ wafer usually takes around 1.5 hours, though this varies with exposure settings.