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ptherm
This is an old revision of the document!
ptherm
ptherm is a multi-purpose plasma etcher. It's the NanoLab's etcher of last resort with no contamination restrictions. We often use it to etch photoresist off devices with gold because gold is not allowed in most (all?) of the other plasma etchers.
Process Notes
| Date | Person | Data |
|---|---|---|
| 19 Jan 2021 | Daniel | A 5min O2 300W etch appears sufficient to remove 2um UV-hardbaked MiR701 photoresist after a 40um DRIE silicon etch (e.g., for the SOI frontside etch). |
| 19 Jan 2021 | Daniel | For a silicon wafer with patterned gold and photoresist on top, the plasma appears to be pale blue while O2 etching photoresist, then pale green once the photoresist is completely removed. |
ptherm.1612944817.txt.gz · Last modified: 2021/02/10 00:13 by dteal
